Atomic Layer Deposition (ALD) Reactor System

SOL #: N00173-26-SSN-TB01Sources Sought

Overview

Buyer

Dept Of Defense
Dept Of The Navy
NAVAL RESEARCH LABORATORY
WASHINGTON, DC, 20375-5328, United States

Place of Performance

Washington, DC

NAICS

Instruments and Related Products Manufacturing for Measuring (334513)

PSC

Laboratory Equipment And Supplies (6640)

Set Aside

No set aside specified

Timeline

1
Posted
Jun 9, 2026
2
Response Deadline
Jun 18, 2026, 9:00 PM

Qualification Details

Fit reasons
  • NAICS alignment with historical contract wins in similar service areas.
  • Scope strongly matches core technical capabilities and delivery model.
Risks
  • Past performance thresholds may require one additional teaming partner.
  • Potential clarification needed on staffing minimums before bid/no-bid.
Next steps

Validate eligibility requirements, assign capture owner, and schedule partner outreach to confirm teaming strategy before submission planning.

Quick Summary

The Naval Research Laboratory (NRL) is conducting a Sources Sought to identify potential sources for an Atomic Layer Deposition (ALD) Reactor System in Washington, DC. This is for market research and procurement planning, not a solicitation. Responses are due June 18, 2026.

Purpose & Scope

The NRL seeks to gauge industry interest and identify capable sources for an ALD reactor system designed for the growth of thin films atop various substrates. The objective is to determine the commerciality of available systems and inform future procurement planning. The attached specifications outline the minimum technical requirements, which are subject to modification.

Key Requirements

The ALD reactor system must be capable of uniform deposition on substrates 150mm or greater, operate in a multi-user facility, and be user-friendly and safe. Key specifications include:

  • Reactor Chamber: Stainless steel, copper-free, single chamber with radial showerhead, accommodating 8-12 precursor sources and 4-6 process gas lines, with optical viewports.
  • Heating: Hot wall operation up to 250°C with ±5% uniformity.
  • Gas Delivery: Minimum 4 individual reactor inputs for precursors and co-reactants.
  • Plasma Source: Inductively coupled high-density plasma (ICP) source (50-1000W) compatible with various gases.
  • Pumping System: Dry process vacuum pump (at least 45 CFM at 100 mTorr) with heated exhaust.
  • Load Lock: Single wafer vacuum load lock system reaching 5 x 10-7 Torr in under 5 minutes.
  • Control System: Windows-11 or later based, dedicated software for control, monitoring, and process development.
  • Performance: Detailed requirements for leak detection, base pressure, gas flow stability, heater uniformity, and specific film deposition quality (Al2O3, HfO2, AlN).
  • Warranty: A 1-year factory warranty covering parts, labor, and travel is required.
  • Installation: At NRL, Washington DC, Building 250, Class 100 clean room. Vendor responsible for installation, training, and documentation.

Response Requirements

Interested parties must submit a Capability Statement (limited to 7 pages) including:

  • Contact Information: Company Name, Address, POC, Phone, Email, UEI, CAGE, Business Size, NAICS/PSC, Socioeconomic Categories.
  • Technical Information: Capabilities relevant to specifications, reseller documentation (if applicable), and any intellectual property details.
  • Commerciality: Address whether the recommended instruments are customarily used by the general public/non-governmental entities, have been sold/leased/licensed/offered to the public, or qualify as a commercial item per FAR Part 2.
  • Product Description: How the proposed product meets or exceeds specifications, including a product brochure. Indicate any modifications needed if specifications are not fully met.
  • Rough Order of Magnitude (ROM): An estimated cost for the project.
  • Comments and Recommendations: Feedback on the specifications.

Contract & Timeline

  • Type: Sources Sought / Market Research
  • Set-Aside: None specified
  • Response Due: June 18, 2026, 05:00 PM EDT
  • Published: June 9, 2026

Additional Notes

This notice is for informational and planning purposes only and does not guarantee a contractual commitment or a future solicitation. The Government assumes no financial responsibility for costs incurred in responding. FAR 52.215-3 applies.

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Sources Sought
Posted: Jun 9, 2026
Atomic Layer Deposition (ALD) Reactor System | GovScope