CHIPS- Nanometer-scale Planar Films and Measurements
Overview
Buyer
Place of Performance
NAICS
PSC
Set Aside
Original Source
Timeline
Qualification Details
Fit reasons
- NAICS alignment with historical contract wins in similar service areas.
- Scope strongly matches core technical capabilities and delivery model.
Risks
- Past performance thresholds may require one additional teaming partner.
- Potential clarification needed on staffing minimums before bid/no-bid.
Next steps
Validate eligibility requirements, assign capture owner, and schedule partner outreach to confirm teaming strategy before submission planning.
Quick Summary
The National Institute of Standards and Technology (NIST) is conducting a Sources Sought for market research to identify vendors capable of providing high-quality thin oxide, nitride, and epitaxial germinide films on silicon wafers with associated metrology data for its CHIPS Metrology Program. This notice aims to understand industry capabilities for nanometer-scale planar films and measurements. Responses are due February 21, 2026, at 5:00 PM ET.
Scope of Work
NIST requires solutions for two classes of materials:
- Class 1: Oxide or Nitride Depositions and Measurements
- Materials: HfO₂, TiN, ZrO₂, SiN (at least two)
- Quantity: At least 10x 300mm wafers OR 15x 200mm wafers.
- Film Deposition: Approximately 8nm film (optimized 5-15nm) on <100> silicon, <5% thickness uniformity, deposited by ALD or equivalent.
- Characterization: X-ray (reflectivity/photoelectron spectroscopy) at 5 points, Optical (spectroscopic ellipsometry) at 100 points.
- Class 2: Epitaxial SiGe on Silicon Wafers and Measurement Data
- Materials: At least two Ge concentrations (15-30%).
- Quantity: At least 10x 300mm wafers OR 15x 200mm wafers.
- Film Deposition: Approximately 20nm epitaxial SiGe film (optimized 15-40nm) on <100> silicon, <5% thickness uniformity, <3% Ge composition uniformity, deposited by MBE/CVD or equivalent. Ge concentration 15-30%.
- Characterization: X-ray (reflectivity/diffraction/photoelectron spectroscopy) at 5 points, Optical (spectroscopic ellipsometry) at 100 points.
Market Research Objectives
This Sources Sought notice will help NIST:
- Identify responsible sources.
- Determine small business availability.
- Understand industry capabilities and limitations.
- Inform the development of draft specifications and acquisition strategy.
- Assess the competitiveness of the requirement.
Anticipated Acquisition & Timeline
NIST anticipates issuing a Request for Quotation (RFQ) in the second quarter of FY 2026, with a contract award projected no later than the fourth quarter of FY 2026.
Response Instructions
Interested parties must submit a written capability statement addressing:
- Company information (name, address, UEI, CAGE, POC).
- Business size and socio-economic status.
- Identification of equipment/services offered, including manufacturer, model, technical specifications, and reseller status.
- Product performance capabilities and customization options.
- Any unmet requirements and suggestions for improvement.
- Country of manufacture and potential changes.
- Alternative NAICS codes.
- Standard commercial terms and conditions.
- Published pricing, discounts, or links.
- Customer references for similar purchases.
- Applicable contract vehicles (e.g., GSA FSS, GWACs).
- Any other relevant market research information.
Submission Details
- Method: Email to donald.graham@nist.gov
- Format: Microsoft Word/Excel or PDF
- Page Limit: 12 pages maximum
- Font: Times New Roman, 11-point
- Margins: Minimum 1 inch on all sides
- Response Due: February 21, 2026, 5:00 PM ET.