Inductively Coupled Etching System

SOL #: 6-S176-Q-00231-00Solicitation

Overview

Buyer

Energy
Energy, Department Of
ARGONNE NATL LAB - DOE CONTRACTOR
Lemont, IL, 60439, United States

Place of Performance

IL

NAICS

Semiconductor Machinery Manufacturing (333242)

PSC

Laboratory Equipment And Supplies (6640)

Set Aside

No set aside specified

Timeline

1
Posted
May 15, 2026
2
Submission Deadline
May 26, 2026, 10:00 PM

Qualification Details

Fit reasons
  • NAICS alignment with historical contract wins in similar service areas.
  • Scope strongly matches core technical capabilities and delivery model.
Risks
  • Past performance thresholds may require one additional teaming partner.
  • Potential clarification needed on staffing minimums before bid/no-bid.
Next steps

Validate eligibility requirements, assign capture owner, and schedule partner outreach to confirm teaming strategy before submission planning.

Quick Summary

Argonne National Laboratory is seeking quotations for an Inductively Coupled Etching System to support advanced research in quantum materials, diamond thin films, and compound semiconductors. This is a Solicitation with award based on a Lowest Price, Technically Acceptable (LPTA) evaluation. Responses are due by 5:00 p.m. CDT on May 26, 2026.

Scope of Work

The requirement is for one advanced inductively coupled plasma etching system with atomic layer etching (ALE) capabilities. The system must be a complete, integrated solution, including design, manufacture, delivery, installation, startup, testing, training, and documentation. Key features include:

  • Dual Capability: Support for both inductively coupled plasma reactive ion etching (ICP-RIE) and ALE process development within a single platform.
  • Advanced Features: Load-lock architecture, reaction chamber for high-precision etching, compatibility with chlorine-based chemistries, in-situ optical monitoring, reduced deposition buildup, stable plasma conditions, and precise substrate temperature control (-20°C to 200°C).
  • Versatility: Electrostatic chuck with helium backside cooling, support for multiple wafer sizes (3-inch, 4-inch, 6-inch) and smaller samples, and dedicated pumping arrangements.
  • Onsite Services: Five days of installation, startup, acceptance testing, and training by qualified engineers at Argonne National Laboratory, Lemont, Illinois.

Key Requirements & Evaluation

Award will be made on an LPTA basis, requiring vendors to provide sufficient documentation demonstrating that their proposed system meets all technical requirements outlined in the Statement of Work.

  • Quality Assurance: Bidders must adhere to Argonne's mandatory quality assurance standards, including specific QA program bases (e.g., DOE O 414.1D, ISO 9001:2015), handling of non-conforming items, and detailed documentation.
  • Contractual Terms: Bidders must comply with Argonne's standard Terms and Conditions for Commercial Goods and Services, which incorporate various FAR and DEAR clauses, and address areas like cybersecurity, disputes, and suspect/counterfeit parts.
  • On-Site Conditions: If on-site work is required, contractors must meet "Moderate Risk On-Site Supplemental Conditions," including explicit approval, indemnification, specific insurance coverage (General Liability, Auto, Professional, Worker's Comp), and stringent Environment, Safety, and Health (ES&H) protocols.
  • Representations & Certifications: Completion of the ANL-70B form is mandatory, covering business information, small business classifications, NAICS codes, and numerous FAR certifications.

Contract & Timeline

  • Opportunity Type: Solicitation
  • Set-Aside: None
  • Response Due: May 26, 2026, by 5:00 p.m. CDT
  • Published Date: May 15, 2026
  • Place of Performance: Argonne National Laboratory, Lemont, IL 60439, United States

Submission Requirements

Vendors must submit:

  • A completed ANL-70 Request for Quotation with pricing and supporting technical evidence.
  • A completed ANL-70B Representations and Certifications.

Contact Information

For inquiries, contact Molly Hunter at mollyhunter@anl.gov or 630-252-3094.

People

Points of Contact

Molly HunterPRIMARY

Files

Files

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Versions

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Solicitation
Posted: May 15, 2026
Inductively Coupled Etching System | GovScope